Procedure – General Clean Room Chemical WorkIn addition to standard chemical safety procedures

Make sure the DI water is turned on in the service bay. Do not leave the clean room while you have any chemical procedures in process.

Chemical Gloves (orange gloves) o After use, rinse the chemical gloves thoroughly with DI from the faucet or DI water gun. o Dry the chemical gloves with either a towel or nitrogen gun.o Do not pull the gloves inside out when removing them. The gloves will not dry properly if

stored inside out and it puts liquids on the inside of the glove.o Store the gloves organized in pairs.

Chemicals gloves inside out Chemical gloves properly dried and stores in pairs

Timed faucet o The left hand faucet is controlled by a timer. It will start when the button on the top panel is

pressed and will stop at the end of 75 seconds. Do not turn off the valve on the faucet or the valve on the front panel. This faucet is useful for rinsing chemical bottles, chemical beakers and containers, tweezers, and gloves.

Chemical bottle rinsing under timed faucet Timed faucet activation buton

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Procedure – General Clean Room Chemical WorkIn addition to standard chemical safety procedures

Empty chemical bottles o When a chemical bottle is used up and empty, rinse three (3) times and put by the trash can in

the chemical room without the bottle cap. This lets the lab manager know the bottle has been rinsed. Write “rinsed” and the date on the bottle label.

Rinsed chemical bottle placed by the trash can in the chemical room

Chemical Containers o When you are finished with a container (dishes, beakers, etc.), rinse and leave open end up

under the chemical hood. Putting the container open end down does not allow it to dry.

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Procedure – General Clean Room Chemical WorkIn addition to standard chemical safety procedures

o There are two containers that contain HF (Hydrofluoric Acid). One is 10 parts DI water to HF (10:1 HF) used in the wafer cleaning and one is BOE (Buffered Oxide Etch) used for etching SiO2

Wafer Cleaning o When moving wafer carriers from chemicals to rinse tanks, always place a tray under the wafer

carrier to catch any dripping chemicals

o There are pre-marked containers for use in measuring the hydrogen peroxide and sulfuric acid. Use them. It is not necessary to get an exact amount, close to the mark is acceptable. Used hydrogen peroxide/sulfuric acid should be dumped in the used hydrogen peroxide/sulfuric acid peroxide container once the mix has stopped reacting. Do not fill to the top!!

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Procedure – General Clean Room Chemical WorkIn addition to standard chemical safety procedures

Beakers for sulfuric/peroxide with marks for amount of each Containers for used sulfuric/peroxide

o There are pre-marked poly beakers for use in measuring the hydrogen peroxide and sulfuric acid. Use them. Remember- weaker solution (hydrogen peroxide) first.

o The sulfuric acid/hydrogen peroxide cleaning solution generates some heat. The cleaning beakers will be hot.

o Used hydrogen peroxide/sulfuric acid can be dumped into the used sulfuric/peroxide containers once the reaction has stopped (bubbling stops) and the solution is cool.

o When finished, be sure to wipe down the chemical hood surface area with a towel and then rinse the towels in DI water thoroughly before disposing in the rash.

o Only tweezers with a green tape are to be used for chemical work. Tweezers should be rinsed and dried after use. Wet tweezers will leave a stain on clean wafers!

o There is a rinse tank at the corner of the fume hood, near the tweezers beaker. It can be used as a pre-rinse. Dip the wafers in the tank with the DI running for a few seconds and then put the wafer carrier into the normal cascade rinse tank. This will allow the normal cascade rinse tank to reach the required resistivity quicker. Turn off the DI when not in use.

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Front rinse tank and valve for quick rinse

prior to using the cascade rinse tank

Procedure – General Clean Room Chemical WorkIn addition to standard chemical safety procedures

Cascade rinse tank (where water enters from the bottom and overflows the top like a dam) o The DI water quality is measured with a water resistivity (conductivity) meter. Higher resistivity

means less mobile ions and contaminants in the water. When wafers with residual acids are immersed in the DI cascade tank, the resistivity drops and as the wafer rinses away the acid contamination, the water resistivity increases.

o The resistivity meter for the cascade rinse tank is located on the control panel above the deck. It has two ranges, kilo-ohm and mega-ohm. Occasionally the meter will begin reading in kilo-ohm. Be sure the reading is in mega-ohm and meets the minimum resistivity of the DI wafer before removing the wafers.

o The resistivity reads 25 mega-ohm when there is no DI water running as the probe is in free air with infinite resistivity. Once DI water starts to flow and cover the probe, a normal resistivity will be shown.

o Also occasionally, the resistivity meter goes into alarm mode. You can usually return it to measuring the resistivity of the wafer by pressing the “ACK” “RES” or “Range”.

Cascade rinse tank resistivity meter Cascade rinse tank valve

Rinser/dryer o The rinser/dryer is only used in the dry mode. The nitrogen needs to be turned on before use

and turned off after use.

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Procedure – General Clean Room Chemical WorkIn addition to standard chemical safety procedures

o The wafer carrier with the yellow and red buttons is the only wafer carrier to be used in the rinser/dryer.

o Wafer carrier must be carefully aligned inside the rinser/dryer.o Be sure the open end of the wafer carrier is facing up to prevent the wafers from falling out

when you remove the carrier.o Wafers should be flipped transferred to your wafer box (eliminate touching the clean wafers

with a tweezers) if you carefully align the pins and holes on each carrier. Be sure to carefully align the holes and pins so the slots on both carriers align.

Yellow and red button wafer carrier for the rinser/dryer Two wafer carriers aligned for flip transfer

Hot plates o Turning on the hot plate requires two steps.

1. Turn on the power. The on-off switch is located along the right side

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Procedure – General Clean Room Chemical WorkIn addition to standard chemical safety procedures

2. Push the center knob, this toggles the reading between set and actual. Set the temperature and push to begin heating.

3. As the hot plate heats, the actual temperature will be displayed.

Nitrogen and DI water o Be sure to turn off the DI cascade rinse tank when done rinsing your wafers. DI water is very

expensive and should not be wasted.o When using the rinse/dryer, be sure to turn off the nitrogen after completion of the drying.

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On-off power switch

Push knob to set or read temperature