CANON ANELVA PVD Equipments Treatment Resin Plasma Sputtering particles Cluster PVD equipment for...
Transcript of CANON ANELVA PVD Equipments Treatment Resin Plasma Sputtering particles Cluster PVD equipment for...
CANON ANELVA PVD Equipments
Packaging PVD Equipment
Semiconductor PVD Equipment
Low Resistivity W metalwith VHF ionized PVD
— Deposition on Resin and Glass
— High Adhesive and High Reliable
— Board Cooling function
DRAM
PVD Cu seed process for WLP/PLP and Interposer
Resin
Low temp degas Ti/Cu metal deposition EL3400
Resin
Surface Treatment
Resin
Plasma Sputtering particles
Cluster PVD equipment for Semiconductor industry
Process ModulesMagnetron PVD (CAELA)
VHF ionized PVD (PCM)
Long Throw PVD
Collimate PVD
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ApplicationsW stacked DRAM conductive wire
Ti/TiN, Al/Ti, Co Silicide
TiN Hard Mask
UBM for Package
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CANON ANELVA CORPORATION
13.4
8.3
6
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STD PVDMagnetron PVD
PCMVHF ionized PVD
Resi
stiv
ity [
cm]
38% reduction200nm
19.3g/cm3
Larger W Grain Size
1
4
2’
3
2