AZ5214 (image reversal) - d1rkab7tlqy5f1.cloudfront.net · AZ5214 (image reversal) Tone Negative...
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AZ5214 (image reversal)
Tone Negative
Reference http://www.microchemicals.com/products/photoresists/az_5214e.html
Spincoat primer HMDS: 3000rpm, bake on hotplate 200°C for 2 minutes
AZ5214: 4000rpm gives a 1.4µm thick layer, 5000rpm 1.25µm
Bake in oven at 90°C for 15 minutes
Exposure 15 to 25 mJ/cm²
Post-exposure bake (PEB) in oven at 120°C for 32 to 52s
Flood exposure EVG 15s
Development MF321 for 50 to 90s
Rinse water
Depending on the desired profile (etchmask or undercut profile for lift-off) parameters like post-exposure time, development time and dose should be selected.
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0.6µm structures:
PEB=32s, development=55s, D=21.25mJ/cm²
PEB=52s, development=55s, D=16.25mJ/cm²
PEB=32s, development=90s, D=25mJ/cm²
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1µm structures:
PEB=32s, development=55s, D=18.75mJ/cm²
PEB=52s, development=55s, D=15mJ/cm²
PEB=32s, development=90s, D=22.5mJ/cm²
PEB=52s, development=90s, D=20mJ/cm²
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2µm structures:
PEB=32s, development=55s, D=18.75mJ/cm²
PEB=52s, development=55s, D=15mJ/cm²
PEB=32s, development=90s, D=21.25mJ/cm²
PEB=52s, development=90s, D=18.75mJ/cm²
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5µm structures:
PEB=32s, development=55s, D=17.5mJ/cm²
PEB=52s, development=55s, D=13.75mJ/cm²
PEB=32s, development=90s, D=21.25mJ/cm²
PEB=52s, development=90s, D=16.25mJ/cm²