Analysis of Microsystems - uni-freiburg.de...Static SIMS: used to determine surface concentrations...
Transcript of Analysis of Microsystems - uni-freiburg.de...Static SIMS: used to determine surface concentrations...
Part 6: Chemical composition of surfaces: XPS, SIMS, FTIR
Contents
X-ray photoelectron spectroscopy (XPS, ESCA)Secondary Ion Mass Spectroscopy (SIMS)Fourier Transform Infrared Spectroscopy
Question: What elements or molecular structures
are present at the surface ?
XPS – X-ray photoelectron spectroscopy
What is XPS?- General TheoryHow can we identify elements and compounds?Instrumentation for XPSExamples of materials analysis with XPS
X-ray Photoelectron Spectroscopy (XPS), also known as Electron Spectroscopy for Chemical Analysis (ESCA) is a widely used technique to investigate the chemical composition of surfaces.
XPS – The Experiment
X-rays
X-ray penetration depth ~1µm.
Electrons are excited in the entire volume.
Irradiated area ~ 1 cm2
Electrons are collected from a small area < 1 mm2
sampling depth: 10 nm
Detector
Sample
XPS – The result
1000 800 600 400 200 0
x 1 x 10
3s
Zn3pZnAuger
Zn2p
3s 3d3pCu
O1sCu Auger
Cu2p
Inte
nsitä
t
Bindungsenergie (eV)
C1s
XPS – The Experiment
X-rays
X-ray penetration depth ~1µm.
Electrons are excited in the entire volume.
Irradiated area ~ 1 cm2
Electrons are collected from a small area < 1 mm2
sampling depth: 10 nm
Detector
Sample
Questions
What is needed to perform this experiment ?What do the X-rays do with the surface ?How are the electrons generated ?Why do we only sample from near surface areas ?How are the electrons analyzed ?What do I learn from all that ?Is the angle at which the detector is operated important ?
XPS – Prerequisites
Solid samples (no liquids or liquid layers)Ultra high vacuum (< 10-6 mbar)Stability against x-rays
Metals, alloys, oxides, ceramics, organic solids, polymers, biological samples
Photoelectric effect with x-rays:
X-ray Photoelectron Spectroscopy(XPS, „Photoemission“)
Determination of the binding energy:
|En| = hν - Ekin
Element specific !!
Evac=0
En
hν
Ekin = hν - |En|
Electron Spectroscopy for Chemical Analysis: ESCA
XPS – Principle
E
Evac=0
continuum
1s K
2s L1
2p1/2 L2
2p3/2 L3
3s M1
K L M
Outer, partially filled levels:„Valence electrons“, EB ~ 10 eVresponsible for chemical bonds
Inner filled levels:Core electronsEB ~ 100 eV…100 keVchemically inactive,important for XP spectra !
XPS – Principle
1s K
2s L1
2p1/2 L2
3s M1
1 eV
10 eV
100 eV
1 keV
10 keV
100 keV
electron bindingenergies
E
Evac=0
2p3/2
XPS – Principle
XPS – The result
1000 800 600 400 200 0
x 1 x 10
3s
Zn3pZnAuger
Zn2p
3s 3d3pCu
O1sCu Auger
Cu2p
Inte
nsitä
t
Bindungsenergie (eV)
C1s
XPS – Auger electrons
X-ray expells photoelectron
Electron from upper level fills this hole andtransfers the energy difference to another outerelectron
This electron is ejected
Kinetic energy does not depend on x-rayenergy
The XPS instrument measures the kineticenergy of all collected electrons. The electron
signal includes contributions from bothphotoelectron and Auger electron lines.
XPS - satellites
During exit the photoelectrontransfers some energy to furtherelectrons that may or may not leavethe atom.
The reduction of the photoelectronkinetic energy shows up asadditional peak at apparent „lowerbinding energy“
XPS – Sampling depth
XPS is very surface sensitive: only the upper 3 – 10 nm are sampled!
Electrons are generated in the entire irradiated volume: 1mm2 wide and about 1 µm deepElectrons generated within sample are strongly inelasticallyscattered and will not leave the sampleRule of thumb: Sampling depth = 3x mean free pathway
XPS – Sampling depth
The mean free pathway, λ
Depends strongly on the kinetic energy of the electronsLargely independent of the type of element of originXPS: Ekin ~ 2 keV, λ ~ 2-3 nmSampling depth: ~3 λ
[but there are ways to play around with that]
λ
Ekin
XPS – more chem: oxidation states
C1s
Very valuable source foradditional information !!!
Four different C1s signals from this trifluoroacetic acid ethylester ???
Binding energy of core electron is effected by the chemical environment (oxidation state)Higher oxidation state shows up leads to a higher binding energy of ‘residual electrons’Chemical shift
XPS – Sampling depth
Modification of detector angle offers depth profile informationExample: SiO2 layer on silicon wafer
Further possibility: depth profiling by combination with ion gunsputtering
XPS – quantitative analysis
Quantitative analysis is possible by comparing the signal either to results fromcalibration measurements or (for homogenous samples) by direct comparison ofcomponent signals:
B
A
B
A
II
nn
=
XPS – How are the electrons analyzed?
Principle components of a XPS
X-ray source: MgKa 1253,6 eV or AlKa 1486,6 eV
Concentric Hemispherical Analyser“ (CHA)
electron detector
Separation of electrons of different kineticenergy via electric field
sample
Analyzer
XPS – examples
150 145 140 135 130Binding Energy (eV)
PbO2
Pb3O4
500 400 300 200 100 0Binding Energy (eV)
O
Pb
Pb
Pb
N
Ca
C
NaCl
XPS analysis showed that the pigment used on the mummy wrapping was Pb3O4 rather than Fe2O3
Egyptian Mummy 2nd Century ADWorld Heritage MuseumUniversity of Illinois
Pigment used in artwork on mummy
XPS-application: analysis of carbon fiber- polymer composite material
Woven carbon fiber composite
XPS analysis identifies the functional groups present on composite surface. Chemical nature of fiber-polymer interface will influence its properties.
-C-C-
-C-O
-C=O
-300 -295 -290 -285 -280Binding energy (eV)
N(E
)/E
XPS – examples
XPS - conclusions
Only suitable for samples stable in UHV
Very surface sensitive
Information on deeper layers e.g. by angle-resolvedmeasurements or by combination with sputtering
Counts elements present at the surface
Quantitative measurements are possible
SIMS – Secondary Ion Mass Spectroscopy
Developed by NASA in the 1960s to investigate the composition of moon rocks. SIMS: used to determine the composition of organic and inorganic solids at the outer 5 nm of a sample.Spatial or depth profiles of elemental or molecular concentrations can be generated.Common: detection of impurities or trace elements
SIMS – principle
ultra high vacuumA beam of primary ions or neutral particles impacts the surface with energies of 3-20 keV.Impact causes a collision cascade amongst surface atoms and between 0.1 and 10 atoms are usually ejected. This process is termed sputtering. The sputter yield depends on the nature of the analyte
SIMS – principle
Secondary ions amount to about 10% of all ejected species.Secondary ions can then be analyzed using mass spectroscopy.
SIMS – apparatus
1. Cesium ion source2. Duoplasmatron3. Electrostatic lens4. Sample5. Electrostatic sector - ion energy analyser6. Electromagnet - mass analyser7. Electron multiplier / Faraday cup8. Channel-plate / Fluorescent screen - ion image detector
SIMS – modes
Static SIMS: used to determine surface concentrations of elements and molecules without significantly altering the analyte.
Dynamic SIMS involves the use of a much higher energy primary beam (larger amp beam current). It is used to generate sample depth profiles.
Imaging SIMS like static SIMS does not alter the analyte appreciably. This mode is used to generate images or maps of analytes based upon concentrations of one secondary ion representing either an element or molecule.
Low ion flux / few primary ions
Sputters away app. only a tenth of an atomic monolayer.
Ar+, Xe+, Ar, and Xe
Long analysis times: >15 minutes.
detection of organic molecules.
SIMS – static mode
SIMS – static mode
Example: structural information from a PMMA surface (plexiglass)a: positive and b: negativ ionsMasses can be correlated with typical fragments from the polymer“more than element counting”
SIMS – dynamic mode
higher ion flux causes notable removal of material from the surface: Sputtering
The beam typically consists of O2
+ or Cs+ ions and has a diameter of less than 10 μm.
The experiment time is typically less than a second.
Ion yield changes with time as primary particles build up on the analyte effecting the ejection and path of secondary ions.
Problem: Sputtering depth is not easily determined from sputtering time
SIMS - conclusions
High cost / effort technique (UHV etc.)
Sometimes long measurement times
Yields information on chemical composition (not only elements)
Depth profiling and imaging are possible
Important tool for very surface sensitive questions (e.g. contaminations)
FTIR – Fourier Transform Infrared Spectroscopy
Uses infrared to excite good vibrationVery important tool for structural analysis in Organic ChemsitryNot a strictly surface sensitive technique (only some variants are)
FTIR – theory
light can be described as an electromagentic wave ...
MicrowavesX-rays
λ/[nm] 1 - 10 10 – 400 400 - 800 800 – 1.000.000 > 1.000.000
(Wavelength [µm]) 1 10 100 1000
(Wavenumber [cm-1]) 10.000 1000 100 10
NIR MIR FIR
Most relevant for analysis oforganic compounds: MIR
Mid-Infrared (MIR): λ: 2.5µm – 25µm (4.000 – 400cm-1)
(ν = frequency/speed of light [cm-1])
photon energies: 1 – 15 kcal/mole
not enough energy to excite electrons
induces vibrational excitations of covalently linkedatoms and groups
covalent bonds can be described as stiff springsthat can be stretched and bent
ν⋅⋅= chE
FTIR – theory
vibrational energies are assigned to quantum levels(analogous to electronic states)frequency of vibration ∝ dissociation energy of chemical bond
treating covalent bondsas stiff springs:
m1 m2
FTIR – theory
m1 and m2: mass of respective atoms
f=‚spring constant‘ – proportional to strength ofcovalent bond
Differences in bond strength?
C-N C=N C≡N1.100cm-1 1.660cm-1 2.220cm-1
Differences in mass?
O-H O-C3.600cm-1 1.240cm-1
m1 m2
FTIR – theory
What happens if molecules are placed in an IR beam ?
permanent dipole in an electrical field starts to rotate and vibrate(stretching and bending);
example: water
molecule takes up energy from the electrical field
FTIR – theory
... but not all molecules do have a permanent dipole ?
induced dipole (e.g. CO2)
induced dipole (methylene-group)
FTIR – theory
permanent dipole not required !
FTIR – theory
FTIR – theory
FTIR – theory
The whole molecule vibrates: fingerprint region in FTIR spectra
Bands that are very characteristic for a given molecule:cannot be easily analyzed in detail„porter spectrometer“
FTIR – theory
Techniques and requirements:
Transmissionrequirements: polished Si-wafer, at least 10nm organic adlayer
DRIFTrequirements: solid powder, powder holder with aligned mirrors for amplification
GIRrequirements: reflecting surface (e.g. gold), organic adlayer down to 2nm can bedetected, increase of sensitivity by increase in pathlength through layer
ATR-IRrequirements: special ATR crystal (thick Si-wafer), organic adlayer down to 2nm canbe detected, increase in sensitivity by multiple reflections at interface
shallow angle (5-15°) large area
FTIR – techniques
... the heart of the IR-maschine ...
Michelson Interferometer1. separating electromagnetic waves2. induce phase shift3. bundeling (interfering) electromagnetic
waves
incominglight
fixed mirror
movable mirror
semipermeablemirror
outgoing light beam
black: ‚reference wave‘ (reflected from fixed mirror)pink: ‚altered wave‘ (from movable mirror)red: resulting wave (interference of black and pink wave)
FTIR – instrumentation
Interferogram using3 wavelengths:
symmetric interferogram
large retardations –fading deviations fromaverage value
Interferogram usingmultiple wavelengths:
Measured intensitybecomes a function ofretardation x of the mirror
∫= νπνν dxIxI )2cos()()(
FTIR – techniques
Do some math:
intensity of polychromatic interference:
rewrite integral as (using window function D):
Fouriertransformation („FT“):
∫=B
dxIxI νπνν )2cos()()(
∫−∞
∞+
= dxxDxII )2cos()()()( πννν
informationin [cm]
information in [cm-1]
FFT
∫−∞
∞+
= νπννν dxDIxI )2cos()()()(
FTIR – techniques
measure spectrum
substract background
FTIR – techniques
No vacuum needed volatile substances may be measured
Yields information on chemical composition (groups)
Surface sensitive techniques are available
FTIR – conclusions