Advanced Solar Photonics FL600 for Solar Applications

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Page 1: Advanced Solar Photonics FL600 for Solar Applications

8/14/2019 Advanced Solar Photonics FL600 for Solar Applications

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LASER PATTERNING & ITO REMOVAL SYSTEM

FL600™ The FL600™ is capable o perorming edge isolation, deletion and patterning on

indium tin oxide (ITO), TCO, TO, anti-reective coatings on glass and PET plastic

flm needed in the silicon and thin-ilm industries. This system makes the process

environmentally sae as no special chemicals are required. This reduces the numbero processing steps compared to conventional technology and it also minimizes

overall production time and cost per unit.

 The FL600™ is customized to accommodate a 2’x4’ solar panel. As oered to solar

companies, it is lexible enough to be incorporated into a ully automated system

or various panel sizes.

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8/14/2019 Advanced Solar Photonics FL600 for Solar Applications

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400 Rinehart Road • Lake Mary, FL 32746 USA

www.advancedsolarphotonics.com • [email protected]

 Tel: 407.829.2613 • Fax: 407.804.1002

New & Unique Features• New XP IIS fiber laser head specifically designed for cold evaporation of 

coatings rom brittle materials

• The laser emits a specific frequency and operates in a special Super Pulsed

mode that enhances the coating removal process

• Laser auto focus mechanism (optional) for highest accuracy and in-line

intelligence

• Adjustable Loading and Unloading positions for in-line integration

• Maintenance free optical path

• Touch screen interface• No need for cooling system

• Ability to handle miniature substrates and macro displays on standard wafer

rames

• Standard wafer frame types (5”, 6”, 8” or 12”)

Process Capabilities• Cleaner image on glass or PET surface. The capability of a 50 micron width

allows layout designers to reduce the width of the spacing between adjacent

die on a substrate.

• The ASP patented method eliminates excessive thermal distortion of a

conventional laser ablation by performing “cold laser ablation” with multiplied

energy per pulse at a high repetition rate leading to the increased throughput

which signiicantly reduces heat damage to the structure.• The elimination of wear items and consumables such as water chillers, filters,

DI water supply, and the increased reliability associated with noncontact

evaporation versus a wet chemical process, greatly decreases the cost o 

ownership o equipment or the end user. This also enables high yield direct

imaging o new materials and designs, complicated layer on brittle materials

such as silicon waers.

• High precision allows for smaller line width.

• Minimized Heat Affected Zone (HAZ)

• Overall increase in speed and efficiency over the conventional Nd: YAG laser

solutions.

Advantages for Users• Low cost solution for edge deletion and isolation

• No optical alignment and realignment during the lifetime of the system

• 5 - 10 times lower power consumption than YAG based systems

• Reduced training level requirements for operators

• Small footprint, modular design utilizes standard components for easier

service.

• “Plug-n-play” characteristics give the system ease of installation and quick 

startup times.

• 24/7/365 maintenance free inline operation outside or inside clean rooms.

• No maintenance on lasers and laser beam delivery system during life time of 

a system