Advanced Circuit Packaging with CBM Technology

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Possibilities and challenges in electronics building and production technology On some cooperation with CPD Center AB Professor Jerker Delsing EISLAB

description

A brief introduction about the cooperation between Luleå University of Technology and CPD Center AB.

Transcript of Advanced Circuit Packaging with CBM Technology

Page 1: Advanced Circuit Packaging with CBM Technology

Possibilities and challenges in electronics building and production

technology

On some cooperation with CPD Center AB

Professor Jerker DelsingEISLAB

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High density electronics

DriversPrice - price scales with size and volume

Low power - shorter leads, less R,LC -> lower operation voltage (P=U2/R)

Performance - shorter leads -> higher clock frequencies

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Comparison Si - PWB

Silicon: 8 - 32 nmPCB: 50 - 250 um

3 - 4 order of magnitude in difference

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What about PWB?!

First PCB:s early 1900The print and etch process patented 1913 - PWB

Feature sizes Trace width - 40 um -- 100 um Via size - 50 um - .... Multi layer boards - 40 layers

Limitation due to the etch process

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Component package

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Chip bonding

Bondwires usually consist of one of the following materials:

Aluminum

Copper

Gold

Wire diameters start at 15 µm and can be up to several hundred micrometres for high-powered applications.

Thermosonic bonding

Ultrasonic bonding

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The wet PCB dream

Sequential Build Up of PWB parts

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The CBM process

• Polymer molecules attach and create Polymer “structures” on the surface

• Works UP FROM surface instead of DOWN INTO surface

• First molecule fastens on surface with a strong covalent bonding

• On surface and inside holes (1:12)

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Copper Build-up

Bare substrate

Polymer Structure build-up

0.5 – 4 μmElectroless Copper

Galvanic platingto desired level

CBM process

Standard processes

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Cu on Teflon© (with primer, TetraEtch)

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Etching vs Sequential build Up (SBU)

SBU

Potentially smaller feature sizes

Enabling embedded component - embedded chip technology

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What’s the difference?

Standard Copper

CBM™ copper

FR4

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First experiments

10 um line width

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Strategies for circuit board interconnect based on the

CBM™ process

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Solder free interconnect

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Solder free interconnect

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Solder free interconnect

Application of CBM™ grafting chemistry

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Solder free interconnect

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Solder free interconnect

CBM™ grafting polymer

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Solder free interconnect

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Solder free interconnect

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Benefits

Takes away:Capsule ~35% of component costBonding ~35% of component cost

Smaller feature sizes at circuit board enablesCircuit board area reductionSmall chip pads

100x100 um today -> 5x5 um -> chip area saving of 400 times100 pads -> 1mm2 -> 0.0025 mm2

Chip size directly proportional to costShorter interconnect leads

Less RLCLower power requirementsHigher performance

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Can we do this today?

LTU has the following lab facilities currently used in research cooperation with CPD Center AB

Clean room facility featuring Down to ISO 14644-1 class 5 CBM™ process Lithography Via hole drilling

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CBM

Lab scale CBM process capable of small series production

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Lithography

Laser lithography Advanced laser writer Line width < 700 nm

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Via making - laser ablation

Cold ablation via diameter<5um