Adv in MEMs for RF Tech Anim

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    ADV in MEMS RF SYS 100600

    DARPADARPA

    Advances in MEMs for RF Technology

    2000 AOC Radar and EW ConferenceSession 2:Technology Developments

    & Impact on Radar/ESM

    25 October 2000

    Mr. Vince Sieracki

    Naval Air Systems Command

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    DARPADARPAMEMS

    (Micro ElectroMechanical Systems)

    Outgrowth of Micromachining

    Creation of unique physical structures through the use of sacrificiallayers resulted in miniature mechanical structures on a substrate (often

    Silicon)

    Open Circuit / Low Capacitance

    Dielectric Layer

    Closed Circuit / High Capacitance

    MEM Switch in RF Applications

    Acts as RF Switch Or Capacitor (100:1 ratios)

    Loss dominated by conductor loss

    Controlled By Static DC Voltage (10 nJ switching energy)

    Low cost processing (~ 5 mask layers)

    High Cutoff Frequency Minimum intermodulation distortion

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    DARPADARPARF MEMS Switch Classification(1.)

    Signal Path: Capacitive; Contact Structure: Cantilever; Bridge; Membrane; Lever Arm; Rotary; Free FloatingActuation: Electrostatic; Electromagnetic; Thermal Topology: Series; Shunt; Combined

    Pull-Back: Spring; Active Throw: Single; Multiple

    Copper (17 um)

    Polyimide (25 um) Thin dielectric (~ 1 um)

    Substrate

    Ball Aerospace - polymer MEMS switch

    (3/29/00 Design Review)

    Antenna array on

    Duroid

    600 um

    100 um

    200 um

    Univ. of Colorado - polymer MEMS switch

    (3/28/00 Design Review)

    Raytheon bow-tie

    MEMS switch

    (2/1/00 Design Review)

    Univ. of Illinois - floating beam switch

    (4/11/00 Design Review)

    HRL - contact switch

    (1/31/00 Design Review)

    GTRI - contact switch

    (Jan 00 Progress Report)

    RF

    Contact

    Apply

    Voltage to

    Clamp

    CantileverArm

    Magnet

    Na2SO4Hg

    1V-3V

    RF out

    RF in

    UCLA - liquid metal switch

    (3/30/00 Design Review)Univ. of Michigan (Rebeiz)

    - microbridge switch

    (5/10/00 Design Review)

    1.RF MEMS Switches, R. Strawser et.al., Air Force Research Lab, Sept 12, 2000

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    DARPADARPA

    MEMS SwitchCapacitively Coupled

    Deposit and pattern bottom metal

    Deposit and pattern dielectric

    Deposit and pattern sacrificial layer

    Deposit, pattern, and release top metal

    Typical Fabrication Process

    Deposit and pattern bottom metal

    Actuation electrode RF line

    Deposit and pattern sacrificial layer

    Deposit and pattern dielectric

    Form contact dimple

    Deposit and pattern top metal and top dielectric

    Release switch

    MEMS SwitchMetal Contact

    1

    1 Schematics are from the Air Force Research Laboratory/ Aerospace Components Division

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    DARPADARPA

    Properties1Switch TypeInsertion

    Loss

    Isolation Power

    Consumption

    DC

    Voltage

    Speed Bandwidth

    PIN/SCHOTTKY ~.15 dB 45 dB 1-5 mW

    per device

    1-10 V 1-5 ns Narrow/

    Wide

    GaAs FETs 1-2 dB ~20 dB 1-5 mW

    per device

    1-10 V 2-10 ns Narrow/Wide

    HBT/PIN 0.82 dB 25 dB 1-5 mW

    per device

    1-10 V 1-5 ns Narrow/

    WideBest FET 0.5 dB 70 dB 5 mW 3.5 V 2 ns Narrow/

    WideMEMS SergioShunt

    0.06 dB @

    20 GHz

    30 dB ~1W 12-14 V > 30s Wide(1-40 GHz)

    MEMS Scott/Jeremy(Shunt)

    0.3 dB @30 GHz

    50-60 dB ~1W ~20 V > 30s Moderate(10-40 GHz)

    Why RF MEMS?

    1 Sanders RECAP In-Process Review 2/00

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    DARPADARPA

    Reconfigurable Apertures

    Elements

    Ground planes

    Array feeds/architecture Phase shifters

    Filters

    MEMS RF Applications

    Advantages of RF MEMS

    High performance, low biaspower consumption

    Potential low costmanufacturing into a varietyof substrates

    Limitations of RF MEMS

    Slower switching speed

    Potential lifetime limitations

    DARPA/SPO is attempting to exploit these MEMS device/componentcapabilities in RF SYSTEMS through the following programs:

    RECAP; MEM-Tenna; Global Eye-STAR.

    APP

    LICATIONS

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    DARPADARPA

    Overall Goals

    Tailoring a radiation pattern dynamically

    - Greater than a Decade bandwidth coverage ;Geometric reconfiguration (horizon-to-horizon)

    - Adapt to frequency spectrum changes

    Reconfigurable Aperture Program

    RECAP

    Reconfiguration For Optimized Performance

    Employ Variable radiatingtopology

    Create a frequency independent

    multi layer ground plane

    Active Reconfigurationof Elements

    Composite StructuralPackaging

    Wide Band FeedNetwork

    Basic Antenna

    Ground plane

    Wire Radiator Element

    Feed

    ~/4

    Basic Antenna

    Ground planeGround plane

    Wire Radiator Element

    Feed

    ~

    RF MEMS currently under investigation as a reconfiguration mechanism

    in each of these areas.

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    DARPADARPA

    Control Chip

    Micro-switch

    Metallic Pad

    GTRI Concept is the Adaptive Design of Element

    From the Connections Between Conducting Pads

    (Pads are Not Patch Antennas, But Simple Conducting Structures

    Connected Pads

    Forming

    a Bow-tie Pattern

    Feed

    MEMS in a Variable Radiating Topology1

    1

    GTRI DARPA RECAP Symposium 2000 - 8

    RECAP Element Anticipated Capability: Allows Adaptive Optimization for Frequency Band Allows Steering of Pattern for Single Feed Aperture

    Lets User Adaptively Trade Bandwidth for Gain

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    DARPADARPA Example of a Reconfigurable Antenna Element

    Switches Open

    Switches Closed

    11 GHz 18 GHz

    1

    2

    1

    2

    1

    2

    MICROSTRIPLINE FEED

    DIEL

    ECTR

    IC2

    GROUNDPLANE

    APERTURE

    MEM SWITCHDIPOLE

    DIEL

    ECTR

    IC1

    MEMS-SWITCHED DUAL-BAND

    DIPOLE ANTENNA1

    1 RECAP Quarterly Review 3/30/2000

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    DARPADARPA

    Predicted Boresight Gain Relative to Free Space(No Resistive Bias Film)

    MEMS in a Wideband Ground Plane

    2-18 GHz frequency range

    ~0.5 inches

    FSS

    MEMS

    Reconfigurable MEMS FSS

    Baluns feedthru to

    elements

    Fixedgroundplane at

    base

    Spiral or Circle elements

    Ball Aerospace & Technologies Corp.Advanced Antenna & Video Systems

    Presented at DARPA RECAP Workshop 3 October 2000

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    DARPADARPA MEM-Tenna Concept

    lOBJECTIVE: To develop and demonstrateultra low-cost, light-weight, low powerphased array antenna technology

    Digital Mirror Device (DMD)Projection System

    Multi-RFChannels

    Transmitters&

    Receivers

    RFIllumination

    Optical

    Illumination

    2-D MEM Lens

    DARPADARPASpecial Projects Office

    Aerostat PTIR

    Applications -Large, low Cost AntennasAdvanced Ship Radar

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    DARPADARPA MEMs - Enabling Technology

    1

    10

    100

    1000

    Cost ($) Power (mW) Loss (dB)

    MEMS

    GaAs MIMIC

    Ferrite

    Diode

    Phase ShifterTechnology

    MEMS advantages lead toeconomies for large scale

    arrays

    10

    100

    1000

    10000

    MEM-tenna ESA Conv. Space Fed

    $(K) / sq. m lbs. / sq. m

    Space - fed lens eliminates cost of many T/R modules

    and weight of beamformer

    Space - fed optical control reduces on-array wiring

    Special Projects Office

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    DARPADARPA

    Photograph

    Photograph Schematic

    X-Band Phase Shifter

    2 bits of 4-bit phase shifter

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    DARPADARPA

    10 GHz 2-Bit (Small) PS Performance

    5.5 - 11.0 GHz Return loss > 11 dB

    6.0 - 10.0 GHz Average insertion loss 0.55-0.9 dB(Arithmetic average of all 4 states)

    2-Bit 10 GHz Phase Shifter - Insertion Loss

    -3

    -2.5

    -2

    -1.5

    -1

    -0.5

    0

    5 6 7 8 9 10 11

    Frequency (dB)

    In

    sertion

    Loss

    (dB)

    0State

    22State

    45State

    67State

    AverageLoss

    2-Bit 10 GHz Phase Shifter - Return Loss

    -40

    -35

    -30

    -25

    -20

    -15

    -10

    -5

    0

    5 6 7 8 9 10 11

    Frequency (GHz)

    Return

    Loss(dB)

    0State

    22State

    45State

    67State

    Measured Characteristics

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    DARPADARPA

    5 6 7 8 9 10 11 12 13 14 15

    Frequency (GHz)

    -40

    -35

    -30

    -25

    -20

    -15

    -10

    -5

    0

    Insert

    ion

    Loss(dB)

    Top-calculated

    Bottom-calculated

    Top-measuredBottom-measured

    Actuationvoltage pad

    Photo of Notch Filter Circuit Measured and Calculated Resultsfor Two State Notch Filter

    CapacitiveSwitch

    Individual RF Switches in Tunable

    Notch Filter Circuit1

    3 mm

    1 Develped by Licoln Lab for the RECAP progrm.

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    DARPADARPA Advanced Multi-Mode Radar

    Multi-Po

    lariza

    tion

    Adaptiv

    eAnte

    nna

    Multiple BeamsReconfigurable Beamformer

    Mode Interleaving

    STAP

    RF

    1

    RF

    2

    RF

    3

    RF

    4

    RF

    1

    RF

    2

    RF

    3

    RF

    4

    PRISTAR Waveform

    Subarray

    Time

    Tx 1 RF1 RF2 RF3 RF4 RF1 RF2 RF3 RF4

    STAR Waveform Utilization

    Tx 2 RF

    1

    RF

    2

    RF

    3

    RF

    4

    RF

    1

    RF

    2

    RF

    3

    RF

    4

    RF

    1

    RF

    2

    RF

    3

    RF

    4

    RF

    1

    RF

    2

    RF

    3

    RF

    4Tx 3

    RF

    1

    RF

    2

    RF

    3

    RF

    4

    RF

    1

    RF

    2

    RF

    3

    RF

    4Tx 4

    Tx Rcv Tx Rcv

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    DARPADARPA Required RF MEMS Technology Activities

    Process Development

    Reproducibility, Yield, cost, performance, complexity

    Reliability

    mechanical longevity

    stiction issues

    Environmental Packaging

    Low cost

    very low loss

    Transition from development to program insertions

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    DARPADARPA Summary

    Advances in RF MEMS provide excitingopportunities to Inject dramatic device/componentadvances into RF SYSTEMS

    Early results show technological feasibility of

    applications in antennas, phase shifters, and filters Additional technology development required beforetransitioning to programs