3D Heterogeneous Integration for e-BRAINS · Pict1_532_d1_600_100x_3-15-3...
Transcript of 3D Heterogeneous Integration for e-BRAINS · Pict1_532_d1_600_100x_3-15-3...
© Montserrat F.-Bolaños, Fukuoka - 27th Sept. 2013 1 IC Device 1 (Technology 1)
MetallisationSystem 1
IC Device 2 (Technology 2) with TSV
MetallisationSystem 2
IC Device 2 (Technology 2) with TSV
MetallisationSystem 2Metallisation
MEMS/NEMS Device
possibly with TSV
Cap -Chip (Wafer)
MEMS/NEMS Device
possibly with TSV
Cap -Chip (Wafer)
MEMS/NEMS Device
possibly with TSV
Cap -Chip (Wafer)
e-BRAINS
1 Nanolab, École Polytechnique Fédérale de Lausanne Switzerland (*at present in IBM
Research Zurich, Switzerland), 2 Fraunhofer EMFT Germany, 3 Infineon
Technologies AG Germany, 4 Magna Diagnostics GmbH Germany,
5 LITEN/DTNM/LCH France, 6 SIEMENS AG Germany
http://e-brains.org
3D Heterogeneous Integration for
Nanosensor Systems - the EU-Project
e-BRAINS
Montserrat Fernández-Bolaños1*, Peter Ramm2, Reinhard Pufall3, Elizabeth
Buitrago1, Christian Zilch4, Hoël Guerin1, Hélène Le Poche5, Roland Pohle6,
Alexandru Popescu6 and Adrian M. Ionescu1
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• e-BRAINS EU-project
Objectives, consortium and project structure
• Introduction: Evading Moore’s law
From 2D IC to 3D Extended CMOS
• Nanosensors: Novel functionality enabled by 3D
Motivation
NanoSensor for gas detection
o CNT gas sensor
o Smart optical gas sensor
NanoSensors for biofluidic applications
o 3D vertically stacked Si-NWs FET
o Smart biosensor grain
Outline
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Main objective: creation of a new generation of nanosensors and complex
advanced microsystems with
• leverage integration of heterogeneous technologies,
• high-performance devices (increased sensitivity, reduced cost)
• miniaturization,
• smart wireless communication
• and best-reliability (highly reliable and robust)
IC Device 1 (Technology 1)
MetallisationSystem 1
IC Device 2 (Technology 2) with TSV
MetallisationSystem 2
IC Device 2 (Technology 2) with TSV
MetallisationSystem 2Metallisation
MEMS/NEMS Device
possibly with TSV
Cap -Chip (Wafer)
MEMS/NEMS Device
possibly with TSV
Cap -Chip (Wafer)
MEMS/NEMS Device
possibly with TSV
Cap -Chip (Wafer)
e-BRAINS
supported by the European Commission
under support-no. ICT-257488
E-BRAINS European Integrated Project
Best-Reliable Ambient Intelligent Nanosensor Systems
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Consortium
A few numbers…
o 20 partners (9 countries)
9 public research
5 large industry
6 SME’s
o 15.25 million euro
o 3 years (2010-2013)
© Montserrat F.-Bolaños, Fukuoka - 27th Sept. 2013 5
Project structure & co-operation
Applications
Smart optical
gas sensor
(SIEMENS)
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The increasing demand for high speed and powerful
electronic devices such as smart-phones, PDA or GPS has
to deal with major design issues:
- RC delay (long signal interconnections)
- Thermal heating
- Power consumption
3D integration is a key technology for
heterogeneous products allowing:
- Improved IC performance at lower cost
- Smart system integration
- Faster signal transmission
- Lower power consumption
Evading Moore’s Law by 3D
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Adapted after: ERD-WG, Japan, December 2007.
3D Extended CMOS
2D SoC
3D heterogeneous
Sytem in Package:
TSV Flip chip
Wire
bonding
Stacked
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Moore’s Law & More
Semiconductor Industry
Association, SEMATECH:
Austin, TX, 2009 (2010 update).
By 2020… it is likely that MEMS fabs will have developed internal
standard process blocks but it will be fab-specific standard tools
(Yole Developpement predicted)
3D heterogeneous
integration with
TSVs and wafer
bonding
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SoC versus SiP
System on Chip (SoC) System in Package (SiP)
Conventional CMOS integration
“More Moore”
Heterogeneous integration
“More than Moore”
Advanced integration based
on the size reduction
Cost reduction
Flexiblility
More functionalities
High integration density
× Technological compatibility
× Complex design of the system,
circuit, package and board
designers
Digital, analog, mixed signal
into a single chip
Planar or stacked
CMOS, RFICs, MEMS, Optics, Energy
in a single package
Wire bonding and flip chip
3D IC stacked with TSVs
System on System (SoS)
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Each die can be designed and fabricated with dedicated and
optimized technology to efficiently:
o Enhance the performance
o Optimize individual functions
o Reduce power consumption
System on System (SoS)
S.-J. Lee, IEEE
SOC Conf 2009
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Biosensors
The application area of biosensors has experience
substantial growth with the global biosensor market
estimated to exceed $14.42 billion by 2016
1. Determination of ultra-low concentrations of specific DNA
sequences can lead to a early detection of
Infectious
Inherited diseases
Genetic disorder
Cancer
2.- Point-of-care instrumentation:
Miniaturized
Reliable
Rapid quantification
Wide range of testing parameters
Enhanced sensitivity of 3D
vertically stacked SiNWs FET
In-situ fast analysis wireless
Smart biosensor grain
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(+) High utilization of bulk silicon substrate.
(+) High output currents Id with number of
channels N in two directions (y, z).
(+) High chances for biomolecule interactions
for sensing:
• Suspended structures entire SiNW
surface area available for sensing.
• High number of sensing channels in 3D.
Ultimate SiNW-based biosensor
3D structures for sensing – The vertically stacked SiNW FET sensor
y
z
x
MOSFET ISFET
Gated through the liquid Metal gate
3D Si-nanostructure for sensing
From planar
ISFET
(+) High Sensitivity:
S/V and cross section
(+) High Selectivity: Si functionalization DNA
molecules, proteins, viruses
(+) Direct monitoring of
biological activities: Low
cost, home care, label free
detection, fast response
• 7x20-array
• Functionalized
for streptavidin
sensing
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o Gate all around (GAA) configuration
o Symmetric/asymmetric gating VBG, VSG
o Excellent SS ~ 75 mV/dec, Vth shifts with VBG
o High gate coupling α’= SS60mV/dec/SSmeasured = 0.8
Electrical Characterization
Ultra thin released NWs, liquid-gated experiments: IPA droplet + glass slide
o SS ~ 100 mV/dec
excellent electrostatic
control through liquid by Vd
o High Ion highly dense
array of NWs
o Low Ioff low doped SOI
substrate.
o Gate all around (GAA) configuration
o Symmetric/asymmetric gating VBG, VSG
o Excellent SS ~ 75 mV/dec, Vth shifts with VBG
o High gate coupling α’= SS60mV/dec/SSmeasured = 0.8
o S = (IdΨ1 - IdΨ0)/ IdΨ0, relative variation of current due to
difference of applied external potential, ΔΨ0: 100 mV
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Electrical Characterization
Ultra thin released NWs, liquid-gated experiments: IPA droplet + glass slide
o HfO2 (εr = 15.6) atomic layer
deposition (ALD) around the NWs
o Prevent charge penetration through
oxide to the SiNWs.
o Reduce Ileaky through the liquid
o Vth shift to high VSG values
o Ion increases with number of NWs
o gm=dId/dVSG sensitivity to surface QS
o High gm larger Id for a given QS
thus, higher S when measuring as Vth.
(+) high gain inverter-based sensing
schemes, where dVout/dVin ~ gm_sensor x Rload.
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7x20 SiNWs, biotin terminated devices: VSG = 1.6 V, Vd = 50 mV, VBG = 0 V, oxide surface
o PDMS microfluidic channel.
o Operated in subthreshold region.
o Current drops several orders of
magnitude after streptavidin shot.
o Successful surface modification,
current drops again after PBS
(phosphate buffer saline) wash.
PBS+
streptavidin
PBS
wash
2mg/ml
Proof of Concept – Streptaviding Sensing
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Smart Biosensor Grain
Motivation:
(+) complex biological samples can be
analyzed rapidly on-site
(+) Allows measurements of multiple
biological parameters in parallel
(+) 3D heterogeneous integrated on a
monolithic sensor grain including
CMOS-TMR sensor + RF chip/antenna
(+) Wireless data and energy transfer
between chip and device
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Smart Biosensor Grain
Biochip equipped with arrays of magnetic resistive (TMR) sensors
Biosensor-unit
Working principle:
Fully 3D integration:
Microfluidic card
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Smart Biosensor Grain
Biochip equipped with arrays of magnetic resistive (TMR) sensors
Results:
o First demonstrator completed on a PCB
o TMR-elements processed
o RFID / antenna chip completed and tested
o Immobilization of biomoleculas on chip
surfaces
Application: Sepsis Diagnostics (Bacteria/Fungi)
Next: further integration TSVs / SLID Bonds
(+) miniaturization
(+) speed (+) simplicity
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- Mass sensing (NEM resonator)
Nanotube gas sensors: Motivation
Y. T. Yang, Nano Lett 2006
F. Patolsky, Materials Today 2005
- Conductance sensing
(Si nanowire) - Current and Vt modulation
(SWCNT FET)
o Molecular detection:
o Gas detection: C. Hierold, ETH Zurich
- Capacitive & conductance
sensing
(capacitive
CNT arrays)
I. Heller, Nano Lett 2008
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Gas sensors
Gas sensor can find applications in the field of industrial gas
monitor, environmental, building automation, health care and
safety.
1. Detection of toxic gases even in very low concentrations
such as
CH4, CO, CO2
NO2,
SOX,
NH3, …
2.- Privacy compliant area monitoring via CO2 detection
Small form factor
High selectivity
Integrated with IC
Cost effective
High sensitivity
CNT gas sensor
Wireless data & power supply
smart optical gas sensor
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o Carbon nanotube (CNT) remarkable properties
– Building block for electronic devices
o Integration issues to implement CNT as a alternate material
for commercial, robust devices
o High throughput, in-situ integration of horizontal, dense CNT
arrays at the wafer scale
o Integration of horizontal CNTs into gas sensors via:
(+) All fabrication processes compatible with full wafer processing.
http://blog.pharmaphysic.fr
CNT-based gas sensor
Catalytic chemical
vapor deposition
process
Selective growth
Directional growth
Catalyst support
Designed for
nucleation on
vertical sidewalls
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catalyst support
• Sputtered stack of TiN, Al2O3, TiN and SiO2
– Nitride-oxide-nitride alternation > selective growth
– Top SiO2 > hard mask
• Dry etching of top TiN & Al2O3
– Catalyst support lines
– Vertical profile > horizontal CNTs
• Electrode shaping
• Fe catalyst local deposition
– Tilt angle 45° > on the sidewall
Fabrication Process
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CNT growth process and device integration
• Thermal CVD process (feedstock gas:
acetylene, hydrogen and helium, T°: 580°C,
pressure: 0.4 mbar)
– Dense MWCNT arrays: mean diam. 4-5nm,
3-4 walls.
• Selective: growth activated on Al2O3/Fe
surfaces
• Directional: CNT nucleate orthogonal to
catalyst surface
• IPA flattening and top contact mettalization
Fabrication Process
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Resistive Gas Sensors
o Electrical properties
– Ohmic behavior
– 84µm wide CNT array
resistance = 7 Ω.µm-1
– Contact resistance~18 Ω
– CNT resistivity = 17.9 e-5 Ω.m
1 000
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Inte
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200 400 600 800 1 000 1 200 1 400 1 600 1 800 2 000 2 200 2 400 2 600 2 800 3 000
(a.u.)
Pict1_532_d1_600_100x_3-15-3
Pict2_532_d1_600_100x_3-15-3
Pict3_532_d1_600_100x_3-15-3
Pict4_532_d1_600_100x_3-15-3
Pict1_532_d1_600_100x_3-15-3
Evaluation Copy
G D
Si
Si
CNT device characterization
o Raman spectra
– Flat RBM no SWCNTs
– No G-band split MWCNTs
– High D-Band contamination
a-carbon
TEM
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o Detection limit < 5 ppm
– TLV 25 ppm
– Adsorption/desorption (fitted by
double exponential model)
o Reliability device to device
o Long response time > 15 minutes
Proof of Concept – Gas Sensing
o Resistance shift to
– NO2, NH3, H2
– Relative humidity
– Ethanol, Toluene
o Robust CNT arrays
– Tested over 7 months
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Motivation:
(+) Tunable diode laser spectroscopy (TDLS)
combine the small form factor of vertical NWs
with the high selectivity of optical gas detection
(+) Photonic band gap crystals (PhCs) used for
absorption path reduction (strong dependence
in the detection limit and accuracy)
(+) Integration of the entire hardware including temperature and current drivers,
the signal acquisition/evaluation and the communication module
Smart Gas Sensor
Based on photonic light concentrator & integrated electronics hardware
ongoing future (1cm)
Cost reduction
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Working principle: light concentrator.
Fabrication: poly-Si rods (aspect ratio 1:25 2D PhC)
Periodic holes in the m range are defined in Si:
1. photolithography and etch
2. filled with adapted IR-transparent material by
vacuum filling
3. Silicon template is then removed to allow the
generation of a periodic pattern of needles.
Smart Gas Sensor
Based on photonic light concentrator & integrated electronics hardware
Reduced group velocity Enhance
interaction
Increase the
effective path
Detection limit
Accuracy
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Results:
o Power plug-in demonstrator including gas
sensor, microprocessor, wireless and power
supply module
o Gas detection: 50 ppm within 1mm path
length. CO2 strong absorption line at 2.7 m
Applications: Air quality (CO2), industrial gas
monitor (NH3, CO, CO2, HF…)
Smart Gas Sensor
Based on photonic light concentrator & integrated electronics hardware
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• The future of Nanoelectronics could be foreseen as a combination of
More Moore and More than Moore with the heterogeneous integration of
a large variety of technologies, and their exploitation in System-On-Chip
or System-In-Package, combining various discrete subsystems using
different optimized process technologies.
Biosensors:
• 3D vertically stacked SiNWs: TSV-compatible, robust, highly sensitivity and
dense (7x20 array) sensing validated (biotin-streptaviding) in a liquid GAA FET.
• The 1st generation of smart biosensor grain fully integrates the CMOS-TMR
sensor and the RFID chip + antenna mounted on a PCB
Gas sensor:
• CNT-based nanosensors: Wafer-scale, in-situ with high yield, dense has been
characterized as resistive gas sensor showing promising sensing capabilities
• Integration technology has help to combine small form factor with the high
selectivity of optical gas detection by absorption path reduction
Conclusions
© Montserrat F.-Bolaños, Fukuoka - 27th Sept. 2013 30 IC Device 1 (Technology 1)
MetallisationSystem 1
IC Device 2 (Technology 2) with TSV
MetallisationSystem 2
IC Device 2 (Technology 2) with TSV
MetallisationSystem 2Metallisation
MEMS/NEMS Device
possibly with TSV
Cap -Chip (Wafer)
MEMS/NEMS Device
possibly with TSV
Cap -Chip (Wafer)
MEMS/NEMS Device
possibly with TSV
Cap -Chip (Wafer)
e-BRAINS
o FP7 Integrated project e-BRAINS and
NEMIAC European Projects
Acknowledgments
Thank you for your attention!
Questions?