1 BROOKHAVEN SCIENCE ASSOCIATES Mirror Metrology and Development Strategy Q. Shen, K. Kaznatcheev,...

1 BROOKHAVEN SCIENCE ASSOCIATES

Mirror Metrology and Development Strategy

Q. Shen, K. Kaznatcheev, A. FluerasuExperimental Facilities Division

NSLS-II Experimental Facilities Advisory Committee Meeting

April 23-24, 2009


Outline

• Mirror requirements at NSLS-II beamlines• NSLS-II strategy for mirror development and metrology• Optical metrology laboratory• Coherence preserving optics R&D• Summary


Mirrors Requirements at NSLS-II beamlines

CHXIXS

CSXSRX

<100 nrad<150 nrad

<0.2 rad

<0.17 rad

• General requirements: < 0.1 rad ~ 1 nm / 1 cm


Experimental Facilities R&D Areas & Budgets


Recruitment of Optical Metrology Expert


Trend in Mirror Fabrication

• Steady improvement of the mirror quality, but not yet to 100nrad / 1nm level• New fabrication technologies emerged: APS (profile coating); Osaka/Spring-8 (Osaka/Spring-8 (plasma chemical

vaporization machining (PCVM) elastic emission machining (EEM); WinLight/ESRF WinLight/ESRF ((polishing of deformed surfaces); SESO (); SESO (Bimorph, piezo embedded)

Courtesy of A. Rommeveaux, R. Barret, ESRF

• New fabrication/polishing tools often require extensive use of in-house optical metrology to allow iterations in the process.


Mirror Development Strategy #1

• Develop NSLS-II metrology tools• Use our own metrology to characterize vendor product – crucial for verification &

acceptance• Leverage our state-of-the-art metrology capability to energize and attract developers

and vendors• At-wavelength metrology: at existing sources, emphasis on coherence preservation

QED test sample (2008): flat Si Takacs & Siddons (BNL)before: 236nm (rms)

after MRF: 10nm (rms)

-1000nm

500nm

BUT

Residual texture due to the tool marks-> need to reduce roughness (to 1/10) at low spatial frequencies

x 20 improvement


Optical Metrology Laboratory

ALS: flat mirror (InSync) measurements

NSLS-II Optical Metrology Lab plans to house/develop cutting-edge metrology tools for advanced optics development:

• Fizeau interferometer• Long Trace Profiler (LTP)• Micro-stitching interferometer• Atomic Force Microscope (AFM)• At wavelength metrology


OM: First Set of InstrumentsSpecification ZYGO VeriFire :Aperture Size 4 in. (102 mm)Zoom Range 1X-6X continuous zoomPupil Focus Range -800 mm/ +1600 mmRepeatability of Three-Flat Test λ/300 (2σ)~2nmRepeatability of rms λ/10,000 (2σ)~0.06nmSpatial Sampling1K x 1K pixel cameraSurface Height Resolution Better than λ/8,000 ~0.1nmReference Optics: Dynaflex (high reflectivity) 4” flat l/20 accuracy4% transmission l/50 accuracy matching cavityBackreflection corner cube

Status: installedFollowUp: development of precise stage (meridional direction, 50nrad) for stitching measurement of curved surfaces

Specification:Motorized Tip/Tilt/X/Y with ±4° 300/300mmVibration Isolation TableObjectives 2.5X, 20X (5 to 0.2mm FoV)Lateral Res. 0.5 μmVertical Scan Range (PZT) 150 μmVertical Res. < 0.1 nmRMS Repeatability < 0.01 nm

Status: NewView 6300 was upgraded with 300mm XY motorized stages to perform stitching interferometry


Next Generation LTP DevelopmentTakacs, P.Z., Qian, S., (BNL): LTP-I; 1987LTP-II: CRADA with Continental Optics, R&D award 1993Pentaprizm based LTP: 1995; In-situ mLTP: by 2005 about ~10 in all major SR centersCurrently aproches 0.35urad performance

Goal: to reach 100 nrad accuracy for large radius SR mirrors (+/-10mrad)

Qian, OptEngineering 2007

> In house + international expert advisory team for LTP development

Participants of Advanced Optical Systems and Metrology for High Power and Coherent Beam Lines Workshop during NSLS 2004 user meeting


Optics Testing at SRID6

undulatorHR X-ray CCD-camera

B-fiberDCM

Si-111Test Optics

• Coherence preservation by multilayers• O. Tchoubar, A. Snigirev, A. Fluerasu et al. Theoretical work on phase retrieval from in-line

holograms. Aim: retrieve the surface profile, power spectral density function• Experimental work at ESRF ID6 (but also get R&D NSLS x16 beamline operational)• Mirror Fabrication/ Multilayer Deposition: R.Conley

Direct beam Multilayer


Mirror Development Strategy #2

• Work/Collaborate with potential vendors• Survey vendors and their current state-of-the-art technologies, organize on-site

presentations and discussions, ... (QED visit Feb.2009, InSync Apr.2009, Zeiss- May)• Spell out NSLSII requirements• Seek potential collaborations, leverage NSLSII state of the art metrology and x-ray

testing capability to energize and attract developers and vendors: aimed at improving their technologies towards reaching our goals

• Proceed with tests and developmentGoal: identify 2-3 reliable vendors by mid-FY11 for procurements of NSLS-II mirrors to

spec and on schedule• Long-term vision

• Aimed at developing novel polishing techniques (not only with vendors, but university..), advanced metrology tools and new approach to state of the art x-ray optics (R&D adaptive optics, mirror cryo-cooling, novel optics (diamond CRL))

• Establish a regional center for advanced mirror technology, involving BNL, upstate research universities, and regional optics manufacturers and vendors


Summary

• NSLS-II plan for mirror metrology and mirror development is in place and being executed

• Recruitment is on-going for an optical metrology expert to lead the effort • Optical metrology laboratory is being established as part of experimental

facilities R&D program• Metrology instruments are being procured and some have already been

installed and ready for use• Remaining key instrument is the next generation LTP that is planned to

be developed in the coming year• Strategy on working with potential vendors is in place

• Goal: to identify and qualify 2-3 reliable vendors by mid-FY11 so that NSLS-II mirror procurement can proceed at spec and on schedule

1 BROOKHAVEN SCIENCE ASSOCIATES Mirror Metrology and Development Strategy Q. Shen, K. Kaznatcheev,...

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