( JB+á 7T-SRAM B B B¥BvB¦ B B B^B B B]Bt...

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7T-SRAM SOI-7T-SRAM : : (i) WBL INV(R) nMOS N1 (i) WBL INV(R) nMOS N1 (ii) WWL RWL nMOS N3,N4 nMOS N5 (ii) WWL RWL nMOS N3,N4 nMOS N5 “1” “1” (FTI) RBL WBL GND VDDM GND WWL WL for N5 BC for N3 BC for N2 : M2 0.8 0 Me Sh b re (Ex. 4 word x 2 bit ) (Ex. 4 word x 2 bit ) - 90nm - V DD = 0.6V - : V tn / V tp = 0.39 / 0.44V - : - SRAM : - 90nm - V DD = 0.6V - : V tn / V tp = 0.39 / 0.44V - : L / W = 0.10 / 0.16µm L / W = 0.10 / 0.16µm - SRAM : 8K-bit (256word x 32bit) 8K-bit (256word x 32bit) - - 0.7mV 51.1mV 0.7mV 51.1mV ‘1’-Write ‘1’-Write ‘1’-write mode ‘1’-write mode read mode read mode 100 150 200 250 5.0 ] Occurrences µ = 0.80 ns σ = 0.10 ns σ/µ = 12.7 % µ = 2.63 ns σ = 0 55 ns 1 % 0.211 0.211 0.127 0.127 (/µ) (/µ) 0 50 100 150 200 250 300 -25 75 100 [mV] Occurrences µ = 0.7 mV σ = 7.7 mV µ = 50.9 mV σ = 7.7 mV Body-bias - (σ/µ): - (σ/µ): 11.0 11.0 0.15 0.15 ( ) ( ) - - 1/73x 1/73x 0.60x 73x 73x Body-tied ( ) Body-bias Body-tied ( ) V th / 3σ = V th /10 V th / 3σ = V th /10 Low 1 '0 '0' W W ) L L L. Chang, 2005 Symposium on VLSI Technology L. Chang, 2005 Symposium on VLSI Technology WBL WBL WBLB WBLB RBL RBL RWL RWL WWL WWL 8T-SRAM 8T-SRAM SOI SOI ? ? - - - - - - 8T-SRAM 13% - - 8T-SRAM 13% - - SRAM SRAM / 7T-SRAM / 7T-SRAM 7/8T-SRAM 7T-SRAM 7/8T-SRAM 7T-SRAM - (73x) (0.57x) - - - (73x) (0.57x) - - (-40%) (-40%) Scaling Scaling 90nm 90nm 65nm 65nm - - - - - - - - - - ?? ?? 6T-SRAM: 6T-SRAM: - - β - - β 8T/7T-SRAM: , β = 1 8T/7T-SRAM: , β = 1 V DD V DD V DD V DD WL=“High” WL=“High” “High” Q “High” Q “High” “High” “High” “High” 6T-SRAM 6T-SRAM “Low” QB “Low” QB WBL WBL RWL RWL RBL RBL WWL WWL “Low” QB “Low” QB “High” Q “High” Q “Low” “Low” “High” “High” “High” “High” 7T-SRAM N1 N1 P2 P2 P1 P1 WBL WBL RWL RWL RBL RBL WWL WWL VSSM(L) VSSM(L) VSSM(R) VSSM(R) VDDM VDDM N2 N2 N3 N3 N4 N4 N5 N5 WBL WBL RBL RBL 7T-SRAM 7T-SRAM T. Suzuki, 2006 Symposium on VLSI Circuits T. Suzuki, 2006 Symposium on VLSI Circuits Lower V th for same I off Lower V th for same I off Y. Hirano et al., VLSI Technology 2007. Y. Hirano et al., VLSI Technology 2007. Hybrid Trench Isolation SOI MOSFET Hybrid Trench Isolation SOI MOSFET Body Body N N + P P - P P + N N + N N - Gate Gate Gate Gate Body Body N N + P P - P P + N N + N N - Gate Gate Gate Gate Y. Hirano et al., IEDM 2003. Y. Hirano et al., IEDM 2003. X-X’ X-X’ Y-Y’ Y-Y’ - Tr. (V th ) - ( I on /I off ) - - - Tr. (V th ) - ( I on /I off ) - - V1 V1 V2 V2 N1 N1 P2 P2 P1 P1 WBL WBL RWL RWL RBL RBL WWL WWL INV(R) INV(R) N2 N2 N3 N3 N4 N4 N5 N5 INV(L) INV(L) VSSM(R) VSSM(R) VSSM(L) VSSM(L) SRAM SRAM V th SRAM V th SRAM V th V th 90nm SRAM 90nm SRAM SRAM SRAM 8T/7T-SRAM: 8T/7T-SRAM: T-SRAM T-SRAM ABC(Active Body-biasing Controlled)-SOI ABC(Active Body-biasing Controlled)-SOI SOI-7T-SRAM SOI-7T-SRAM - / - - / - 43% 36% 43% 36% N : # of shared memory cells (MCs) N : # of shared memory cells (MCs) 1.00 1.10 1.20 1.30 1.40 1.50 0 8 16 24 32 -3.00 -2.00 -1.00 0.00 1.00 2.00 64word 128word 256word Timing slack (t WWL -t body ) [ns] Timing slack (t WWL -t body ) [ns] ( N =32 ) ( N =32 ) Area overhead (prop./conv.) Area overhead (prop./conv.) vs. / vs. / V WWL V WWL V body V body N < 8: N < 8: time time N > 8: N > 8: V WWL V WWL V body V body time time (2) (2) ( ( 3) 3) (V th ) (4) (4) (V th ) (5) (5) (1) (1) RBL(prop.) RWL RBL(conv.) BL out (prop.) BL out (conv.) 8.19ns 4.69ns CLK RBL(prop.) RWL RBL(conv.) BL out (prop.) BL out (conv.) 8.19ns 4.69ns CLK WWL VSSM(L) V1(conv.) V1(prop.) V2(conv.) V2(prop.) 3.05ns 4.80ns WBL CLK V body (N1) VSSM(L) V1(conv.) V1(prop.) V2(prop.) 3.05ns 4.80ns WBL CLK V body (N1)

Transcript of ( JB+á 7T-SRAM B B B¥BvB¦ B B B^B B B]Bt...

Page 1: ( JB+á 7T-SRAM B B B¥BvB¦ B B B^B B B]Bt Û-cas.eedept.kobe-u.ac.jp/~iijima/research/LSIWS2007_poster.pdf · tp = 0.39 / −0.44V B B¤B®BsBtBzBpB_Bu L / W = 0.10 / 0.16µµmm

7T-SRAM

SOI-7T-SRAM

:: (i) WBL INV(R) nMOSN1

(i) WBL INV(R) nMOSN1

(ii) WWL RWLnMOS N3,N4 nMOS N5

(ii) WWL RWLnMOS N3,N4 nMOS N5

“1”“1”

(FTI)

RBLWBLGND VDDM GND

WWL

WL

forN5

BC forN3

BC forN2

: M2

0.8

0

Me

Shbre

(Ex. 4 word x 2 bit )(Ex. 4 word x 2 bit )

- 90nm- VDD = 0.6V- :

Vtn / Vtp = 0.39 / −0.44V

- :

- SRAM :

- 90nm- VDD = 0.6V- :

Vtn / Vtp = 0.39 / −0.44V

- : L / W = 0.10 / 0.16µmL / W = 0.10 / 0.16µm

- SRAM : 8K-bit (256word x 32bit)8K-bit (256word x 32bit)

--

0.7mV 51.1mV0.7mV 51.1mV

‘1’-Write‘1’-Write

‘1’-write mode‘1’-write mode read moderead mode

100

150

200

250

5.0

]

Occ

urre

nces µ = 0.80 ns

σ = 0.10 nsσ/µ = 12.7 %

µ = 2.63 nsσ = 0 55 ns

1 %

0.2110.211 0.1270.127( /µ)( /µ)

0

50

100

150

200

250

300

-25 75 100

‘ [mV]

Occ

urre

nces

µ = 0.7 mVσ = 7.7 mV

µ = 50.9 mVσ = 7.7 mV

Body-bias

- (σ/µ):- (σ/µ):

11.011.0 0.150.15 ( )( )

--

1/73x1/73x 0.60x

73x73x

Body-tied ( )

Body-bias

Body-tied ( )

Vth / 3σ = Vth/10 Vth / 3σ = Vth/10

Low

1'0'0'WW

)

LL

1'0'0'WW

)

LL

L. Chang, 2005 Symposium on VLSI Technology L. Chang, 2005 Symposium on VLSI Technology

WBLWBL WBLBWBLB RBLRBLRWLRWLWWLWWL

8T-SRAM8T-SRAM

SOISOI??

--

--

-- 8T-SRAM 13%-- 8T-SRAM 13%

--

SRAMSRAM

/7T-SRAM

/7T-SRAM

7/8T-SRAM7T-SRAM7/8T-SRAM7T-SRAM

- (73x) (0.57x)--

- (73x) (0.57x)-- (-40%)(-40%)

ScalingScaling

90nm90nm90nm90nm

65nm65nm65nm65nm

---

---

-

-

-

-

????

6T-SRAM:6T-SRAM: -- β-- β

8T/7T-SRAM: , β = 18T/7T-SRAM: , β = 1

VDD

VDD

VDD

VDD

VDD

VDD

VDD

VDD

WL=“High”WL=“High”

“High”Q

“High”Q

“High”“High” “High”“High”

6T-SRAM6T-SRAM

“Low”QB

“Low”QB

7T-SRAM-SRAM

WBLWBLRWLRWL

RBLRBL

WWLWWL

“Low”QB

“Low”QB“High”

Q“High”

Q

“Low”“Low” “High”“High”

“High”“High”7T-SRAM

N1N1

P2P2 P1P1

WBLWBLRWLRWL

RBLRBL

WWLWWL

VSSM(L)VSSM(L) VSSM(R)VSSM(R)

VDDMVDDM

N2N2

N3N3

N4N4

N5N5WBLWBL

RBLRBL

7T-SRAM7T-SRAM

T. Suzuki, 2006 Symposium on VLSI Circuits T. Suzuki, 2006 Symposium on VLSI Circuits

Lower Vthfor same Ioff

Lower Vthfor same Ioff

Y. Hirano et al., VLSI Technology 2007.Y. Hirano et al., VLSI Technology 2007.

Hybrid Trench Isolation SOI MOSFET

Hybrid Trench Isolation SOI MOSFET

Body

Body

NN++PP--

PP++

NN++

NN--

Gate

Gate

Gate

Gate

Body

Body

NN++PP--

PP++

NN++

NN--

Gate

Gate

Gate

Gate

Y. Hirano et al., IEDM 2003.Y. Hirano et al., IEDM 2003.

X-X’X-X’

Y-Y’Y-Y’

- Tr. (Vth)-

( Ion/Ioff )--

- Tr. (Vth)-

( Ion/Ioff )--

V1V1 V2V2N1N1

P2P2 P1P1

WBLWBLRWLRWL

RBLRBL

WWLWWL

INV(R)INV(R)

N2N2N3N3

N4N4

N5N5

INV(L)INV(L)VSSM(R)VSSM(R)VSSM(L)VSSM(L)

SRAMSRAM

VthSRAM

VthSRAM

VthVth

90nm SRAM90nm SRAM

SRAMSRAM 8T/7T-SRAM: 8T/7T-SRAM:

T-SRAMT-SRAM ABC(Active Body-biasing Controlled)-SOIABC(Active Body-biasing Controlled)-SOI

SOI-7T-SRAMSOI-7T-SRAM

- /-- /-

43%36% 43%36%N : # of shared memory cells (MCs)N : # of shared memory cells (MCs)

1.00

1.10

1.20

1.30

1.40

1.50

0 8 16 24 32-3.00

-2.00

-1.00

0.00

1.00

2.0064word

128word256word

Tim

ing

slac

k(t

WW

L-

t bod

y) [

ns]

Tim

ing

slac

k(t

WW

L-

t bod

y) [

ns]

( N =32 )( N =32 )

Area

ove

rhea

d (p

rop.

/con

v.)

Area

ove

rhea

d (p

rop.

/con

v.)

vs. / vs. /

VWWLVWWL

VbodyVbody

N < 8:N < 8:

timetime

N > 8:N > 8:VWWLVWWL

VbodyVbodytimetime

(2)(2) ((3) 3) (Vth)(4)(4) (Vth) (5)(5)

(1)(1)

RBL(prop.)

RWL

RBL(conv.)

BLout(prop.)

BLout(conv.)

8.19ns

4.69ns

CLK

RBL(prop.)

RWL

RBL(conv.)

BLout(prop.)

BLout(conv.)

8.19ns

4.69ns

CLK

WWL

VSSM(L)

V1(conv.)

V1(prop.)

V2(conv.)

V2(prop.)

3.05ns

4.80ns

WBL

CLK

Vbody(N1)

VSSM(L)

V1(conv.)

V1(prop.)

V2(prop.)

3.05ns

4.80ns

WBL

CLK

Vbody(N1)