Terrence E. Zavecz Weir Temporal Response New TEA Systems Software Presentation from new Weir...

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Yield Enhancement thru Modeling TEA Systems - 3 Data import and sensor response Time-selection reduced analysis range Activation temperature is lower-limit of energy calculation Phase Threshold is used in the Phase Analysis to set sensitivity to thermal-rise slope change. Mouse-over curve shows time/ temperature. When a sensor curve is passed, a red square is generated. Red-square is replicated on each sensor’s thermal curve.

Transcript of Terrence E. Zavecz Weir Temporal Response New TEA Systems Software Presentation from new Weir...

http://www.TEAsystems.com

Terrence E. Zavecz tzavecz@TEAsystems.com

Weir Temporal ResponseNew TEA Systems Software

Presentation from new Weir Temporal Analysis software

http://www.TEAsystems.com - 2Yield Enhancement thru ModelingTEA Systems

Overview

Weir TR Weir Temporal Response

New Analysis Sections

Data Import Plotting Temperature value vs time at each sensor site Range controls The Range plot

Temperature range vs High/low values Phase analysis

Examination of constant vs rise/fall portions of the cycle Phase graphics

By sensor, temperature and phase. Contour Mapping

Of Temperature, rise times and Energy

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Data import and sensor response

• Time-selection reduced analysis range

• Activation temperature is lower-limit of energy calculation

• Phase Threshold is used in the Phase Analysis to set sensitivity to thermal-rise slope change.

• Mouse-over curve shows time/ temperature.

• When a sensor curve is passed, a red square is generated.

• Red-square is replicated on each sensor’s thermal curve.

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Analysis restriction

Time has been restr icted to 2,000 < time < 2405 seconds

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Interactive graphics

Red-box on curve marked by red-spot on “temp-variation vs time” wafer plot (right)

Simply hover mouse over top curve to move spot

Notice “High” central range of wafer with low upper left & lower right

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Variation from Wafer Mean Temperature

Response uniformity at each probePerfect uniformity is a horizontal line across the center

of the circle.

Time

Variation from Mean Degrees

Time 2560 sec

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Phase Analysis – Primary Graph

Press “Phase Tab” Phase graph shows:

Upper/Lower “red” temperature range at each point of process. (right ordinate )

Range in temperature at each time segment (left ordinate of graph with black squares)

Calculated Phase transitions with a yellow box at each phase time.

Statistics are excerpts from the “RiseTimesPhase” spreadsheet.

Temperature range of all sensors

Max/min range measured Phase

transition point

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Range Plot

Statistics show four thresholds which are plotted as yellow-filled squares.

Range of data across wafer @ time is plotted by blue circles

Max Temp

Min Temp

Phase changeRange

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“RiseTimesPhase” spreadsheet

Details each process phase (upper chart) Lower chart shows the range of values for the phase.

Thresholds - Acc: 0.1% Temperature: 380

AveragePhase Period Type TimeStart TimeEnd TimeDelta TempStart TempEnd TempDelta TempMean Energy (deg*sec) Ramp (deg/sec)

1 Rise 2005.00 2046.25 41.25 380.16 381.61 1.45 381.18 15700.00 0.062 Constant 2061.25 2248.75 187.50 381.45 379.71 -1.74 380.30 71300.00 -0.013 Rise 2263.75 2359.38 95.63 382.90 393.15 10.25 390.16 37100.00 0.154 Constant 2369.17 2399.17 30.00 391.89 393.72 1.83 393.22 11800.00 0.03

Range Range Range Range Range RangePhase TimeStart TimeDelta TempStart TempDelta Ramp(deg/sec)EnergyMax EnergyMin

1 0.00 25.00 13.38 0.87 0.14 19400.00 9380.002 25.00 200.00 13.58 2.28 0.04 82800.00 7520.003 210.00 115.00 13.88 14.38 0.37 74300.00 30800.004 95.00 60.00 23.16 11.49 0.35 31500.00 7760.00

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Reference variation across end of cycle

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Terrence E. Zavecz tzavecz@TEAsystems.com

Additional Phase-Analysis Graphics

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Sensor Graphs Three libraries of graphics are

created with the Phase Analysis.

Sensor Library From “SensorResponse”

spreadsheet Details response of each

sensor for the analysis Rise Times Library

From “RiseTimes” spreadsheet

Details specifics about the range of time and temperature for each phase and phase-change.

Radial Library From “RiseTimes”

spreadsheet Details process response as

a function of the sensor’s radius on the substrate (wafer).

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Time-cumeEnergy graph Shows the thermal energy

injected into the substrate E = (time * (Temperature-To) To = threshold temperature

One curve for each sensor To should be set the the

Arrhenius threshold for the reaction.

NOTE: Any graph can be right-mouse

clicked to edit the colors and display.

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Temperature by sensor

Range of temperature experienced by each sensor

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Temperature variation from Phase mean

Variance in temperature for each sensor From the mean temperature of the phase

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Cumulative Energy

Integrated energy at each sensor and the phase in which it occurred

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Temperature Phase Error over time

Phase error over time for each sensor

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Rise-time slope over time

Slope (deg/sec) as a funciton of time for each sensor

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Slope vs Temperature

Rise/Fall time slope vs Temperature

Final temperature for each probe.

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Locations of designated sensors on substrate

Last tab in library

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Terrence E. Zavecz tzavecz@TEAsystems.com

Rise/Fall -Time Graphs

Process Rise/Fall statistics

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Cumulative energy

Cumulative energy for each phase and sensor Threshold was set to 380 deg.

So temperatures below 380 deg yield no additional energy. Note TC16 and TC2 who contribute very little.

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Averge temperature for each phase

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temperature Rise/fall for each phase

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Time spent at each phase

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Temperature at the start of the phase

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Temperature at the end of the phase

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Exact time of each phase transition start

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Exact time of each phase transition end

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Maximum slope experienced by the probe

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Slope mean and Minimum for the probe

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Terrence E. Zavecz tzavecz@TEAsystems.com

Radial Response Library

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Cumulative energy by Radial Position

The Phase 3 fitted curve was added by right clicking on the graph and using the “Trend” tab

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Various other graphs

2nd order curves fitted to each phase

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Uniformity Plots

Selected 4 times for display: 18 00 sec (3 45 de g) 22 95 sec (3 79 de g) 24 00 sec (4 00 de g) 25 60 sec (4 00 de g)

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Full screen setup

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Individual displays

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Plots with gridlines for transitions

displays

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Another thermal matrix

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Animation and control of thermal swings

1. Select the time-slices for plotting.

2. Select the method of display.3. Press “Create maps” to

display contour plots.4. After display, then the maps

can be viewed individually.5. Select either “One plot per

screen” to view video of thermal display.

6. Animation control manages video presentation.

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Terrence E. Zavecz tzavecz@TEAsystems.com

Weir Temporal Response for Full Analysis Sequence

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Thermal response ranges

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Range across the wafer

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Average times for each phase

Phase Period Type TimeStart TimeEnd TimeDelta TempStart TempEnd TempDelta Energy (deg*sec) Ramp (deg/sec)1 Constant 10.0 1063.1 1053.1 319.8 279.5 -40.3 2.740E+05 -0.04032 Constant 1078.1 1223.4 145.3 280.0 282.0 2.0 4.090E+04 0.01563 Rise 1238.4 1396.9 158.4 285.3 340.3 55.0 5.120E+04 0.35244 Constant 1411.9 1905.0 493.1 340.7 341.7 1.1 1.680E+05 0.00275 Rise 1920.0 2053.4 133.4 344.5 381.6 37.1 4.960E+04 0.28606 Constant 2068.4 2275.0 206.6 381.3 379.5 -1.8 7.850E+04 -0.00957 Rise 2290.0 2380.3 90.3 383.3 395.1 11.9 3.540E+04 0.15758 Constant 2395.3 2560.0 164.7 395.1 394.5 -0.7 6.500E+04 -0.0036

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Statistical ranges of each phase

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Matrix Display

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Rise Times

Rise times plotted at 8 times over critical final rise

Notice initial rise on left side of wafer at 2295 seconds with a slope range from 0.217 to 0.256 dec/sec

rise

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Plotting Energy, Rise Times and Cumulative Energy

Select data type with drop-down control

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Threshold Analysis data

Data from the “RiseTimesPhase” worksheet for 16 sensors Transition points are marked on the thermal curve as black squares with a yellow center (previous slide)

Temperature variation