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Automated alignment procedure for s3tching with a focused ion beam

Marie Verbist

17 June 2010

nano photonics

nano photonics very very small photonic chips

nano photonics very very small photonic chips fabricated with nanometer precision

nanophotonics

focused ion beam

alignment procedure

nanophotonics

focused ion beam

alignment procedure

waveguides by focused ion beam s3tching

nanophotonics

focused ion beam

alignment procedure

confining and guiding light

photonic components

fabrica3on

Light can be confined by refrac3ve index contrast

high n

layer sandwich of materials with different refrac3ve index (n)

high n

total internal reflec3on light stays in the core with higher n

high n

total internal reflec3on light stays in the core with higher n

higher index contrast smaller core and sharper bends

high n

Waveguides are the basis of many nanophotonic components

cross‐sec3on air (n=1)

Si (n=3.4)

SiO2 (n=1.4)

top view

Waveguides are the basis of many nanophotonic components

cross‐sec3on air (n=1)

Si (n=3.4)

SiO2 (n=1.4)

top view

CMOS fabrica.on tools ideal for industry

?? ideal for research

mass fabrica3on prototype fabrica3on

long development cycle short development cycle

not all materials all materials

CMOS technology is not ideal for prototyping

Focused Ion Beam tool

nanophotonics

focused ion beam

alignment procedure

working principle

need for s3tching

An ion beam is focused scanned blanked

A focused ion beam tool enables milling and imaging

target

Ga+ beam

Impact causes atoms to be spuTered away

target

Ga+ beam

spuTered atoms

Impact causes atoms to be spuTered away

This allows for milling holes

target

Ga+ beam

spuTered atoms

Impact causes atoms to be spuTered away electrons to be released

This allows for milling holes

target

Ga+ beam

secondary electrons

spuTered atoms

Impact causes atoms to be spuTered away electrons to be released

This allows for milling holes imaging (through electron detec3on)

target

Ga+ beam

secondary electrons

spuTered atoms

Large structures need to be s3tched

same number of pixels for any field width

field width

same number of pixels for any field width for a certain required scan resolu3on, the FW is limited

large FW small FW

low resolu3on high resolu3on

same number of pixels for any field width for a certain required scan resolu3on, the FW is limited

structures larger than the field width have to be s3tched i.e. etch part of the structure, move stage, etch next part, …

large FW small FW

low resolu3on high resolu3on

nanophotonics

focused ion beam

alignment procedure

adjus3ng the beam rota3on

adjus3ng the beam shi[

Problem 1 : misalignment of beam and stage axes

Beam axes and stage axes are slightly misaligned

Solu3on 1 : adjust beam rota3on

Determine angle between stage and beam axes move stage to the corners of a square mill alignment markers in each corner and image calculate angle from rotated square

mill & image

mill & image move stage

image & match

Problem 2 : inaccuracy of stage moves

Stage moves are too inaccurate causing overlap or space between the several milled parts

Solu3on 2 : adjust beam shi[

Determine beam shi[ to compensate for stage inaccuracy based on image recogni3on of markers

mill & image

mill & image move & match

mill & image move & match mill & image

The waveguide itself is never imaged to avoid damage/losses

nanophotonics

focused ion beam

alignment procedure

nanophotonics

focused ion beam

alignment procedure

waveguides by focused ion beam s3tching

Long waveguides could be s3tched

80 μm

Long waveguides could be s3tched

80 μm

Structures are unlimited in size

80 μm

1.5 mm

Structures are unlimited in size except by the size of the sample

80 μm

1.5 mm

Photonics Research Group www.photonics.intec.ugent.be

nanophotonics

as large as we want nanophotonics

Photonics Research Group www.photonics.intec.ugent.be

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