Post on 14-Sep-2020
SuMMITSuMMIT Application Notes:Application Notes:
#1 #1 –– SuMMITSuMMIT is not just for is not just for SEMsSEMs anymoreanymore
EUV Technology, EUV Technology, SuMMITSuMMIT Software DivisionSoftware Division
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
SuMMITSuMMIT supports aerial supports aerial
image data image data � SuMMIT is a general purpose litho analysis package
� SuMMIT works with wide variety of input data
� SEM (CD/analytic/cross-section …)
� AIMS tools and microscopes
� Aerial image (AI) and resist modeling tools
�Prolith
�Solid-EUV
�Panoramic
�MAST (our soon-to-be-released AI modeling tool)
� AFM
� Any device that creates a graphical image
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
Case study 1: AIMS dataCase study 1: AIMS data
Load an AIMS
image file.
SuMMITsupports nearly
all standard image formats
through the “File->Load
SEM image”
menu as well as device specific
formats through the “File-
>Import” menu
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
Case study 1: AIMS dataCase study 1: AIMS data
This example
image is an EUV
AIMS image file courtesy of
Yujen Fan, CNSE and
acquired using
the SEMATECH Berkeley AIT.
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
Crop tools
Rotate tools
Case study 1: AIMS dataCase study 1: AIMS data
Rotate and crop
image as desired using
Image Proc Menu. Various
other basic
imaging process features are
available through this
same menu.
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
Case study 1: AIMS dataCase study 1: AIMS data
With the region of interest selected, Auto Fence and calculate to get CD and LER data as you would for any SEM image. Through dose behavior can be simulated by changing the analysis threshold.
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
Case study 2: AI modelingCase study 2: AI modeling
Load a Prolith(for example)
aerial image
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
Modeled aerial
image of mask
with LER
Case study 2: AI modelingCase study 2: AI modeling
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
Case study 2: AI modelingCase study 2: AI modeling
SuMMITincludes a
default AI modeling
analysis recipe
that may be used if desired
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
Case study 2: AI modelingCase study 2: AI modeling
Analysis results show LER of 1.6
nm and infinity
LER of 12.9 nm. Large infinity
LER comes from significant
line-to-line CD
variation.
Infinity LER
estimated from
line-to-line CD
variation: Constantoudis et
al., JVSTB 22,
1974 (2004).
Var∞
= Var(W) + Var(CD) + Var(σW)
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
Case study 3: AI MEEFCase study 3: AI MEEF
Enable the
contact-hole-analysis toolbox
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
Case study 3: AI MEEFCase study 3: AI MEEF
Load a modeled
aerial image of a field of contacts
where one
contact had a ~3% error on
the mask, then Auto Fence and
process (calculate).
summit@euvl.comsummit@euvl.com
www.euvl.comwww.euvl.com/summit/summit
Case study 3: AI MEEFCase study 3: AI MEEF
Open the
Advanced Contact Plot
Tool for a plot of all the CDs. The
results show a
CD error on the one contact of
~3% indicating a MEEF of 1.
SuMMITSuMMIT Litho Analysis SoftwareLitho Analysis Software
For more information
please visit www.euvl.com/summitor contact summit@euvl.com