ALD/CVD Material & Equipment Market Trends

Jonas Sundqvist, Ph.D, Techcet & Fraunhofer IKTS

by Techcet Groupa Techcet CA LLC Company

CMC 2016www.Techcet.cominfo@Techcet.com

Outline

ALD Semiconductor Applications

ALD Equipment Market

ALD/CVD Precursor Market & Growth Trends

Novel ALD processes and technologies

Summary

www.techcet.com info@Techcet.com

ALD Semiconductor Applications

ALD Applications & Markets

Tapani AlasaarelaNanobakers Oy 2015

ALD Equipment 2015US$ 1.0 to 1.2 M

Semiconductor Non-Semiconductor Research & Development

Estimates 2016, BALD Engineering(Market reports, Financial Analysts, OEMs)

ALD Applications for Memory & Logic

2003 2004

Hafnium Zirconium

ALD Applications for Memory & Logic

Application Logic Memory / Capacitor R&D

High-k HfO2 Al2O3, ZrO2, HfO2, Nb2O5, Ta2O5 ATO, SrOx, SrTiO3, BST

Metal Gates/Electrodes TiN, TaN, TiAl, TiAlN TiC, TaC TiN Ru

Contacts TiSi, NiSi, CoSi, W Pt

Spacer/Liners/Multi patterning SiO2, SiNx SiO2, SiNx, Al2O3 Inorganic/organic hybride

BEOL TiN, TaN, Co Mn, MnSi2, Ru, CNT, Graphene, SAMs

SADP – SAQP Lam Research

Scaling trend ALD MigrationI - Migration to ALD due to shrink- LPCVD SiN and SiO2- PECVD SiN and SiO2- CVD Metals- CVD Metal nitrides- PVD Metals

II - New Materials & Unit Processes:- MIM Caps & High-k / Metal Gate - Cu barriers- Multipatterning

III - 3D Devices: DRAM, FinFET, 3DNAND More ALD

Scaling trend ALD MigrationI - Migration to ALD due to shrink- LPCVD SiN and SiO2- PECVD SiN and SiO2- CVD Metals- CVD Metal nitrides- PVD Metals

II - New Materials & Unit Processes:- MIM Caps & High-k / Metal Gate - Cu barriers- Multipatterning

III - 3D Devices: DRAM, FinFET, 3DNAND More ALD

2007 2009 2011 2013 2016 2018N

Low Power

Leading Logic

Fully loaded45nm

32nm22nm

ALD Global Supply Chain

“ALD is now firmly established as a key enabling technology. Today, ALD has become a critical technology for the manufacture of virtually all leading-edge semiconductor devices. The leading customers in our industry have already ramped several device generations based on our ALD equipment – for high-k metal gate applications in Logic and Foundry and for multiple patterning applications in the Memory sector” (Chuck Del Prado, CEO , ASM)

Chemicals & Gases ALD OEMs Fabs

Air Liquide, Adeka, Air Products, SAFC, DSC, UPChem, Soulbrain, ..

Intel, Samsung, TSMC,Globalfoundries, SMIC, UMC, SK Hynix, Micron, ST Microelectronics, Infineon, NXP, Bosch Sensor Tech, TDK, TI, …

Components

Swagelock, MKS, In USA, Rasirc, Edwards, Fujikin, Bronkhorst, …

ALD Equipment

ALD Equipment Evolution

J A van Delft et al 2012 Semicond. Sci. Technol. 27 074002

Large Batch

Single Wafer Multi Wafer

Spatial ALD

Reactor Types

ALD Equipment Market

1,000.0

1,200.0

1,400.0

1,600.0

1,800.0

Single/MultiWafer

x2 in 3-4 Years

Main Growth in Single Wafer & Multi Wafer

ALD Precursor Market & Growth Trends

ALD / CVD Metal & High-k Forecast

Total Co (CoCOCp)5%

Total Ta (PDMAT)10%

Total Ti (TiCl4)3%

Total Hf HKMG (HfCl4)

Total Zr Capacitor (ZrCp, TEMAZr)

Total Ti (TDMAT)6%

Total Al (TMA)4%

Total W (WF6)24%

ALD/CVD High-k & Metal Precursos 2015 $255M 2015 Market 9.4% 5 yr. CAGR

High Growth forecasted in BEOL Cu Metallization Barrier/seed

High-k is being introduced on 200mm technologies >65nm

MEMS utilization of ALD metal and barrier layers are increasing

>90% DRAM

2013 2014 2015 2016 2017 2018 2019 2020

Total Co (CoCOCp) $7.19 $9.48 $14.44 $22.67 $29.72 $38.51 $48.42 $60.12

Total Ta (PDMAT) $20.96 $23.41 $25.01 $26.94 $28.54 $29.59 $29.39 $29.11

Total Ti (TDMAT) $14.69 $15.57 $15.90 $16.65 $17.29 $17.79 $17.68 $17.69

Total Hf HKMG (HfCl4) $12.76 $19.09 $20.39 $29.45 $37.52 $51.37 $63.33 $77.27

Total (Hf,Ta, Sr etc.) $0.19 $0.42 $0.52 $2.53 $3.91 $7.05 $9.75 $12.87

Total Al (TMA) $11.25 $10.12 $9.38 $9.52 $10.04 $9.33 $8.82 $9.81

Total Zr Capacitor (ZrCp, TEMAZr) $140.17 $118.15 $102.19 $99.67 $101.96 $90.10 $81.29 $94.43

Total Ti (TiCl4) $7.84 $7.34 $7.16 $7.35 $7.79 $7.30 $6.95 $7.43

Total W (WF6) $52.72 $60.91 $63.15 $70.28 $78.37 $86.17 $88.17 $89.94

$50.00

$100.00

$150.00

$200.00

$250.00

$300.00

$350.00

$400.00

$450.00

ALD/CVD Metal Precursor Market 2015 to 2020

The combined revenues for all high-k and metal precursors (inorganic and organic) used for front end ofline (pre-interconnect) and back end of line (interconnects) device fabrication of logic and memory isestimated to have totaled over $258M in 2015 and could approach $400M by 2020

Novel ALD processes and technologies

controlling process drift becomes much more challenging

next-generation tolerances are in atomic scale

device aspect ratios continue to increase

Drivers for Atomic Layer Processing: Feature size shrink, 3DIC Scaling & EUV alternative

FinFET > Gate-all-arround Transistor > 3DNAND

3D Device scaling

Multiple Patterning > BCP Patterning

Nano Patterning

22 nm <10 nm 3DIC´s 22 nm <10 nm

Selective ALD will enable patterning <7nm

Atomic Layer Etching - ALE

ALE cyclic process, consisting of four steps: (1) Chemisorption of a gas (chlorine in this case) on the surface(chemisorption step). (2) Chamber evacuation to remove all but the chemisorbed gas. (3) Ion irradia- tion tochemically sputter the top layer of substrate atoms (etching step). (4) Product evacuation to remove theetch products from the chamber

T. Faraz et al. ECS J. Solid State Sci. Technol. 2015;4:N5023-N5032

S. D. Athavale and D. J. Economou, J. Vac. Sci. Technol. A

13, 966 (1995).

Summary

ALD/CVD Metal & High-k precursor market has totaled over $258M in 2015 and could approach $400M by 2020

ALD/CVD Dielectric precursor market will grow from $250M to $300M by 2020 driven by multipatterning and migration from LPCVD & PECVD to ALD

ALD Equipment market to Double from $650 M to $ 1,300 M in the next 3-4 years

Nano Patterning & 3D Devices drive the market for Atomic layer Processing for:

• Deposition

• Etching

• Selective bottom up growth

ALD2016 Dublin Ireland

Simon ElliottTyndall National Institute,Ireland

Jonas SundqvistDivision of Solid State Physics,Lund University, Sweden

ALD 2016 Co-Chairs:

www.ald2016.com

Thank you!JSundqvist@Techcet.com

+49-152-0294-3083http://techcet.com/product/high-kald-precursors/

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